Intern - Photolithography Process Development

singapore, singapore, Singapore • Posted June 06, 2026

Job Type: Full-time

Location: singapore, singapore

Posted: June 06, 2026

Category: Other-General

Application Deadline: July 16, 2026

Role Description

Overview Location: Fab10N Singapore 
Department: Process Development – Singapore (Photolithography) 
Project title: Edge Placement Error Modeling and Optimization 
Project Description: Develop and optimize models for overlay and critical dimension uniformity improvement. Project scope: Introduction to photolithography for semiconductor patterning and control. 
Deliverables Develop and deploy edge placement error model for photolithography 
Skillset Required Mathematical modeling and numerical analysis with programming knowledge (preferred) 
Characterization techniques: SEM, optical imaging 
Course Of Interest Semiconductor Manufacturing 
Nanomaterials 
Physics 
Mathematical modeling 
Programming 
Duration 4-6 months (minimum 4 months) 
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