Mask Technology Scribe Engineer
Bengaluru, India, India • Posted June 04, 2026
Job Type:
Full-time
Location:
Bengaluru, India
Posted:
June 04, 2026
Category:
other-general
Application Deadline:
June 11, 2026
Role Description
**About the team**
This position is on TI’s Advanced Technology Development (ATD) Mask Technology and Pattern Generation (MTPG) team.
We support mask building, reticle generation, scribe array generation, layout generation & verification methodologies.
**Mask Technology Scribe Engineer**
Seeking motivated Scribe Development engineer
+ Supporting Scribe Layout (KERF) Development and Support across various process nodes
**Job description:**
+ Development and Support of Tech/fab-specific scribe recipe development & maintenance to generate reticle floorplan databases
+ Understanding of ETEST structures, fab alignment structures and photolithography
+ Collaborate with & guide various teams within Advanced Technology Development (process development, PDK), EDA and business units to ensure the necessary information is available to complete the tapeout process.
+ Ensure consistent application of methodologies and best prac...
This position is on TI’s Advanced Technology Development (ATD) Mask Technology and Pattern Generation (MTPG) team.
We support mask building, reticle generation, scribe array generation, layout generation & verification methodologies.
**Mask Technology Scribe Engineer**
Seeking motivated Scribe Development engineer
+ Supporting Scribe Layout (KERF) Development and Support across various process nodes
**Job description:**
+ Development and Support of Tech/fab-specific scribe recipe development & maintenance to generate reticle floorplan databases
+ Understanding of ETEST structures, fab alignment structures and photolithography
+ Collaborate with & guide various teams within Advanced Technology Development (process development, PDK), EDA and business units to ensure the necessary information is available to complete the tapeout process.
+ Ensure consistent application of methodologies and best prac...
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