Photolithography Process Development Engineer (Advanced Patterning)
Lehi, UT, United States • Posted May 28, 2026
Job Type:
Full-time
Location:
Lehi, UT
Posted:
May 28, 2026
Category:
other-general
Application Deadline:
June 06, 2026
Role Description
**Change the world. Love your job.**
We’re at the forefront of an exciting era of semiconductor innovation at Texas Instruments’ LFAB in Lehi, Utah — home to our state-of-the-art 300mm manufacturing facility now ramping our most advanced 28nm analog and embedded process technology in the heart of the Silicon Slopes. As part of our Advanced Technology Development (ATD) organization, you will be challenged with developing and characterizing the next generation node. We are seeking a highly skilled and hands-on Process Development Engineer with deep expertise in advanced-node semiconductor manufacturing. This role focuses on the next generation 20nm-class logic technologies, with primary responsibility for photolithography and litho-etch integration, including advanced patterning techniques such as pitch doubling (SADP/LELE). This role will also work directly with the Resolution Enhancement Techniques (RET) team to create Optical Proximity Corrections (OPC) and validate final p...
We’re at the forefront of an exciting era of semiconductor innovation at Texas Instruments’ LFAB in Lehi, Utah — home to our state-of-the-art 300mm manufacturing facility now ramping our most advanced 28nm analog and embedded process technology in the heart of the Silicon Slopes. As part of our Advanced Technology Development (ATD) organization, you will be challenged with developing and characterizing the next generation node. We are seeking a highly skilled and hands-on Process Development Engineer with deep expertise in advanced-node semiconductor manufacturing. This role focuses on the next generation 20nm-class logic technologies, with primary responsibility for photolithography and litho-etch integration, including advanced patterning techniques such as pitch doubling (SADP/LELE). This role will also work directly with the Resolution Enhancement Techniques (RET) team to create Optical Proximity Corrections (OPC) and validate final p...
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